Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

随着半导体制程技术的持续进步，晶片微缩已达到物理极限，传统的光刻技术面临挑战。在此背景下，原子层沉积（Atomic Layer Deposition，ALD）技术因其薄膜沉积精度，成为推动半导体微缩的关键技术之一。

Atomic Layer Deposition (ALD) is a sophisticated technique used to create thin films with exceptional precision and uniformity. This method has gained significant attention in recent years due to ...

Atomic Layer Deposition (ALD) is a highly controlled technique used to create thin films, particularly silicon nitride (SiNx), which is essential in various microelectronic applications.

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

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such as atomic layer deposition (ALD) and nanoimprint lithography, will enable the creation of complex, multi-material structures with unprecedented precision and functionality. Additionally, the ...

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Evaluating multilayer coatings for neural implants, this study finds hafnium-based ALD layers excel in biostability, ensuring long-term device functionality.

The Fiji is a modular high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible system architecture and multiple configurations of precursors and plasma gases. The ...

Forge Nano, Inc., an atomic layer deposition solution provider, today announced the completion of its new semiconductor ...