The lineup of semiconductor heat treatment furnaces performs oxidation, diffusion and CVD at 140 deg-C - 2000 deg-C. The heat treatment furnaces are used for power semiconductors, silicon and composite semiconductors, solar cells, organic EL (OLED), polyimide, MEMS, VCSEL and other materials.

In semiconductor technology many thermal processes are used at atmospheric pressure and at low pressure. Atmospheric processes are used for diffusion of dopands, annealing and oxidation of semiconductor materials, mainly silicon.

Discover how semiconductor furnaces ensure precise temperature control critical for oxidation, diffusion, annealing, and deposition processes. Learn about the importance of predictive maintenance and continuous monitoring with vibration sensors to prevent downtime and maintain wafer purity levels.

This large-bore vertical furnace for 4.5G/5.5G was developed by making use of semiconductor manufacturing equipment technologies for glass substrate manufacturing. This furnace is suitable for low-compaction organic EL (OLED/AMOLED) frit sealing processes and dewatering. The semiconductor diffusion furnace has been modified to a larger scale ...

Semiconductor furnaces for diffusion, oxidation, doping, and other processes in wafer and cell manufacturing (4”, 6”, 8” and 12” wafers).

This vertical furnace with a built-in stocker processes 8-inch wafers at ultra-high temperatures in large batches. This furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments.

This large-batch mass-production type vertical diffusion furnace can process a maximum of 100 wafers (300-mm / 12-inch) or 16 FOUPs a batch. An LGO heater is used for superior temperature characteristics from low temperatures to medium high temperatures.

A400 DUO is a batch vertical furnace for 200mm and smaller wafers, and focuses on applications in the markets for power, analog, RF, and MEMS devices. The A400 DUO furnace tool is capable of running low pressure CVD (LPCVD), as well as diffusion and oxidation applications.

SONORA is a 300mm batch vertical furnace for logic/foundry and memory applications, as well as 300mm analog/power. SONORA is capable of both atmospheric and low-pressure thermal wafer processing.

2024年7月29日 · Established in 1982, SH Scientific, a leading manufacturer of laboratory equipment, has recently introduced advanced tube furnace turn-key systems that seamlessly integrate various semiconductor manufacturing processes, including doping, oxidation, annealing, and chemical vapor deposition.